Oxygen Plasma Cleaning



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English: The surface of a MEMS device is cleaned with bright, blue Oxygen Plasma in a Plasma Etcher to rid it of carbon contaminants. (100mTorr, 50W RF)
Date 15 July 2010(2010-07-15)
Source Own work
Author Maxfisch

Maboudian Lab, UC Berkeley


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EXIF data:
File name oxygen_plasma_cleaning.jpg
Size, bytes 4210468
Mime type image/jpeg
Image input equipment manufacturer CASIO COMPUTER CO.,LTD.
Image input equipment model EX-Z85
Orientation of image 1
Image resolution in width direction 72/1
Image resolution in height direction 72/1
Unit of X and Y resolution 2
Exposure time 1/25
F number 31/10
Exposure program 2
ISO speed rating 200
Compressed bits per pixel 46366720/8957952
Exif version 0221
Lens focal length 630/100
Date and time original image was generated 2010:07:15 16:28:12
Date and time image was made digital data 2010:07:15 16:28:12
Meaning of each component 
Exposure bias 0/3
Maximum lens aperture 33/10
Metering mode 5
Supported Flashpix version 0100
Color space information 1
Exif image width 2592
Exif image length 3456
InteroperabilityOffset 37722
Digital zoom ratio 0/0
Focal length in 35 mm film 38
Gain control 2
Interoperability index R98
Interoperability version 0100
Software used Microsoft Windows Photo Gallery 6.0.6001.18000
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