Chemical-mechanical polishing (CMP-108, conditioner)



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Source page: http://commons.wikimedia.org/wiki/File:Chemical-mechanical_polishing_(CMP-108,_conditioner).jpg
English: Pad conditioner (Chiaping model 108) for the chemical-mechanical polishing (CMP), which removes material from uneven topography on a wafer surface until a flat surface is created.
Deutsch: Pad-Konditioner (Chiaping Modell 108) für das chemisch-mechanische Polieren (CMP), CMP entfernt Material auf einer Wafer-Oberfläche und glättet somit eine unebenen Topographie.
Date 25 August 2005(2005-08-25), 14:10
Source CMP-108
Author cpxmn

See discription under [1]


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Checked copyright icon.svg This image was originally posted to Flickr by cpxmn at http://flickr.com/photos/22041495@N02/2126608662. It was reviewed on 12 April 2010(2010-04-12) by the FlickreviewR robot and confirmed to be licensed under the terms of the cc-by-sa-2.0.

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